Evaluation of alignment accuracy for nanoimprint lithography
2022年10月5日 · The accuracy of alignment with the underlying layer in UV nanoimprint lithography has been improved by using a method of making separate alignment marks. This enables the practical realization of low-cost patterning with a half-pitch of 14 nm in a single patterning step, which is impossible by optical lithography.
Next-Generation Lithography Process: Nanoimprint - KIOXIA …
2018年8月28日 · The nanoimprint technique uses imprinting to transfer nanoscale patterns on a template to a Si wafer, and unlike conventional lithography tools, it does not require a lens optical system for reduction projection. The nanoimprint is a highly anticipated next-generation lithography method to realize advanced memory devices with reduced cost.
Nanoimprint Lithography Aims to Take on EUV - IEEE Spectrum
6 天之前 · Kioxia is one the chip companies interested in using Canon's nanoimprint lithography system. Canon In September, Canon shipped the first commercial version of a technology that could one day upend ...
Nano-Imprint Lithography (NIL) | Products and Services | DNP …
Nano-Imprint Lithography is a technology to fabricate fine circuit patterns on the substrate in the order of nm (nanometers) using the ultra fine resin patterns which is formed by stamping the template (master) having surface morphologic patterns of …
Process technology/14nm Half-pitch Direct Patterning - KIOXIA
2020年3月17日 · In order to cope with shrinking of semiconductor device pattern dimension below 30nm half pitch and increasing fabrication cost, we are developing low cost Nanoimprint Lithography (NIL.)
Japanese company Kioxia Semiconductor has developed nano-imprint …
Nowadays, the core-making process is highly dependent on lithography machines. The nano-imprint lithography technology (NIL) led by the Japanese company Kioxia Semiconductor Co., Ltd. has successfully realized the manufacture of chips, without the need for ultraviolet light sources, and the process can achieve The level of 5nm.
It can be directly up to 5nm without EUV. Kioxia and its partners ...
2024年12月12日 · According to Japanese media reports, Kioxia has cooperated with semiconductor equipment manufacturer Canon and DNP, a semiconductor component manufacturer such as masks and templates, to develop Nano Imprint Lithography (NIL) at the Kioxia factory in Yokkaichi, Mie Prefecture, Japan.
Nanoimprint Finally Finds Its Footing - Semiconductor Engineering
2023年4月20日 · First introduced in the mid-1990s, nanoimprint lithography (NIL) has consistently been touted as a lower-cost alternative to traditional optical lithography. Even today, NIL potentially is capable of matching current EUV dimensions, yield, and throughput using fewer process steps and significantly lower capital equipment costs.
Half pitch 14 nm direct pattering with Nanoimprint lithography
We developed a nanoimprint lithography (NIL) technology including NIL system, template and resist process for half pitch (hp) 14 nm direct pattering. The latest NIL system NZ2C shows the mix and match overlay (MMO) of 3.4 nm ( 3σ) and the template life around 125 lots.
Nanoimprint Lithography - Canon Global
Canon has achieved miniaturization at lower power consumption and lower cost with nanoimprint lithography (NIL), a new technology that is an alternative to conventional lithography technology. By enabling inexpensive production of patterns of 15nm or smaller, NIL is poised to revolutionize the semiconductor industry.